Nanolaser (image) University of Texas at Austin Share Print E-Mail Caption This is an illustration of the nanoscale semiconductor structure used for demonstrating the ultra-low-threshold nanolaser. A single nanorod is placed on a thin silver film (28 nm thick). The resonant electromagnetic field is concentrated at the 5-nm-thick silicon dioxide gap layer sandwiched by the semiconductor nanorod and the atomically smooth silver film. Credit copyright Science Usage Restrictions None Share Print E-Mail Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.