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Contact: Liz Ahlberg
University of Illinois at Urbana-Champaign

Real-Time Etching Topography

Caption: This is a three-dimensional image of the University of Illinois logo etched into a gallium-arsenide semiconductor, taken during etching with a new microscopy technique that monitors the etching process on the nanometer scale. The height difference between the orange and purple regions is approximately 250 nanometers.

Credit: Chris Edwards, Amir Arbabi, Gabriel Popescu, and Lynford Goddard

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Related news release: New method monitors semiconductor etching as it happens -- with light

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