Contact: Michael E. Newman
michael.newman@nist.gov
301-975-3025
National Institute of Standards and Technology (NIST)

NIST Team Develops Novel Method for Nanostructured Polymer Thin Films

Caption: (Top L.) Schematic of the NIST 'cold zone' annealing process for polymer thin films on a semiconductor wafer. Experiment images are color-coded to show regions with different cylinder orientations, as measured by atomic force microscopy. Relatively rapid transit times (top r.) leave a jumble of different regions that become largely homogeneous at slower speeds (r.).

Credit: NIST

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Related news release: NIST team develops novel method for nanostructured polymer thin films