Contact: Chad Boutin
National Institute of Standards and Technology (NIST)
Caption: The three-dimensional tri-gate (FinFET) transistors shown here are among the 3-D microchip structures that could be measured using NIST's technique for improving through-focus scanning optical microscopy (TSOM).
Credit: Courtesy of Intel Corp.
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Related news release: Microscopy technique could help computer industry develop 3-D components