Contact: Michael Baum
michael.baum@nist.gov
301-975-2763
National Institute of Standards and Technology (NIST)

New Paper Reveals Nanoscale Details of Photolithography Process

Caption: Schematic of the photolithography process shows the formation of a gradient extending from the photoresist material to be removed (center) into the unexposed portions of the resist on the sides. NIST measurements document the residual swelling fraction caused by the developer that can contribute to roughness in the final developed image.

Credit: NIST

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Related news release: New paper reveals nanoscale details of photolithography process