Contact: Michael Baum
michael.baum@nist.gov
301-975-2763
National Institute of Standards and Technology (NIST)

Making a Good Impression: Nanoimprint Lithography Tests at NIST

Caption: Electron micrograph shows a cross-section of a typical SOG microcircuit feature. Nanoporous regions in the interior are lighter. The process forms a dense, stronger skin about 2 nanometers thick on the outside. (Color added for clarity.)

Credit: NIST

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Related news release: Making a good impression: Nanoimprint lithography tests at NIST