图1 (A)二元铟基硫族化合物在热电领域的研究趋势及(B)其纯相材料在300 K下的热导率和最大zT值的性能数据。 (IMAGE)

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Shengnan Dai
Materials Genome Institute, Shanghai Engineering Research Center for Integrated Circuits and Advanced Display Materials, Shanghai University, Shanghai 200444, China.
musenc@shu.edu.cn

Lirong Song
Materials Genome Institute, Shanghai Engineering Research Center for Integrated Circuits and Advanced Display Materials, Shanghai University, Shanghai 200444, China.
lirongsong@shu.edu.cn

Jiong Yang
Materials Genome Institute, Shanghai Engineering Research Center for Integrated Circuits and Advanced Display Materials, Shanghai University, Shanghai 200444, China.
jiongy@t.shu.edu.cn

图1 (A)二元铟基硫族化合物在热电领域的研究趋势及(B)其纯相材料在300 K下的热导率和最大zT值的性能数据。 (IMAGE)

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