Fabrication process and actual image of the silicon-based neural microelectrode array. (IMAGE)
Caption
Fabrication process and actual image of the silicon-based neural microelectrode array. a 1800 μm thick double-polished silicon wafer. b Microneedle array root fabrication with etching. c Microneedle array backboard formation with Silicon-glass bonding. d Microneedle array backend metallization. e Microneedle array pillar formation with sawing. f Microneedle array needle formation with wet etching. g Microneedle array metallization. h Microneedle array after local de-insulation. i Photograph of the completed microneedle array. j Photograph of a packaged microneedle array.
Credit
Microsystems & Nanoengineering
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CC BY-NC-ND