hong-oxides (IMAGE)

University of Nebraska-Lincoln

hong-oxides

Caption

Husker physicists (from left) Xiaoshan Xu, Peter Dowben, Evgeny Tsymbal, Xia Hong and Zuocheng Zhang stand next to an oxide thin film deposition system inside Hong's lab at the University of Nebraska-Lincoln. 

Credit

Jordan Opp/University Communication and Marketing/University of Nebraska-Lincoln

Usage Restrictions

For use with reports of DOE/EPSCoR grant to Xia Hong for ferroelectric oxide and related research.

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