Nondestructive direct photolithography of colloidal quantum dots enabled by benzophenone-based crosslinkers (IMAGE)
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A benzophenone-based photosensitive crosslinker capable of achieving submicron-scale patterning under i-line photolithography without performance degradation was developed. The resulting crosslinked devices exhibited significantly enhanced electroluminescent performance compared to conventional counterparts.
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Nano Research, Tsinghua University Press
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