From SEM image to etching insight. (IMAGE)
Caption
From SEM image to etching insight. This figure shows the full workflow behind the study’s AI-assisted etching analysis. It begins with experimental data collection and SEM imaging of DRIE structures, then illustrates how the VLSet-AE reconstructs etched contours under physics-based constraints. By segmenting scallops along etched sidewalls and bottoms, the model automatically recognizes profile boundaries and extracts critical geometric features from cross-sectional SEM images, enabling faster and more reliable analysis for intelligent MEMS manufacturing.
Credit
Microsystems & Nanoengineering
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CC BY-NC-ND