Electron Redistribution by Fluorine‑Induced Dual Defects in Cu3P Accelerated Charge Transfer Toward High‑Performance Electrochemical Chloride Ion Removal (IMAGE)

Shanghai Jiao Tong University Journal Center

Electron Redistribution by Fluorine‑Induced Dual Defects in Cu3P Accelerated Charge Transfer Toward High‑Performance Electrochemical Chloride Ion Removal

Caption

  • Heteroatom doping-induced vacancy was achieved by molten salt treatment.
  • The dual defects led to marked electron redistribution, accelerating electron transfer and ion diffusion kinetics.
  • The electrodes with dual defects exhibited superior areal deionization capacity and rate.

Credit

Ziqing Zhou, Yifan Ren, Fei Yu, Jie Ma*.

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License

CC BY-NC-ND

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