NIST Team Develops Novel Method for Nanostructured Polymer Thin Films (IMAGE)

National Institute of Standards and Technology (NIST)

NIST Team Develops Novel Method for Nanostructured Polymer Thin Films

Caption

(Top L.) Schematic of the NIST 'cold zone' annealing process for polymer thin films on a semiconductor wafer. Experiment images are color-coded to show regions with different cylinder orientations, as measured by atomic force microscopy. Relatively rapid transit times (top r.) leave a jumble of different regions that become largely homogeneous at slower speeds (r.).

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NIST

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