Schematic Illustration of Approach (IMAGE)

University of Illinois Grainger College of Engineering

Schematic Illustration of Approach

Caption

a) This is a schematic illustration of the one-step polymer-free approach to fabricate patterned graphene on a flexible substrate. A stencil mask is designed by computer-aided design software and fabricated by a laser cutter. The fabricated mask is aligned on the as-grown CVD graphene on a Cu foil, and the exposed graphene region is removed by oxygen plasma. The patterned graphene is laminated onto a flexible substrate, followed by etching of the copper foil. b) Optical microscope images and photographs of various stencil masks with sophisticated micro-scale features (top row) and corresponding graphene array patterns transferred onto SiO2 substrate and flexible Kapton film (bottom row). All scale bars: 300 μm.

Credit

University of Illinois

Usage Restrictions

None

License

Licensed content

Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.