Beam Line 9.3.1 at Berkeley Lab's Advanced Light Source (IMAGE)

DOE/Lawrence Berkeley National Laboratory

Beam Line 9.3.1 at Berkeley Lab's Advanced Light Source

Caption

A view inside the experimental chamber used in a chemistry experiment at Berkeley Lab's Advanced Light Source. Researchers used 'tender' X-rays to explore a nanometers-thick region known as the electrochemical double layer at ALS Beam Line 9.3.1.

Credit

Marilyn Chung/Berkeley Lab

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