figure 1 (IMAGE)
Caption
Complex refractive index and transparency of low?loss hydrogenated amorphous silicon. The optical properties are manipulated by changing the process temperature TP, and chamber pressure PC. a) The captured images show hydrogenated amorphous silicon films deposited at various TP. Scale bar: 1 cm. b,c) Measured refractive index (n) (b) and extinction coefficient (k) (c) for hydrogenated amorphous silicon films deposited under various TP. The green and orange regions represent the conditions where n > 4.0 and k < 0.15. d) The captured images show hydrogenated amorphous silicon film samples deposited at various PC. Scale bar: 1 cm. e,f) Measured n (e) and k (f) under various PC. The green and orange regions represent the conditions, where n > 3.5 and k < 0.10. The blue rectangles, green circles, and red triangles represent measured data at the wavelengths of 450, 532, and 635 nm, respectively. The solid lines are guides. g-h) The visible transparency of conventional and low?loss a?Si:H are compared with out?door pictures captured at Pohang University of Science and Technology, Republic of Korea: g) Background; h) Conventional a?Si:H deposited at TP = 400 °C, and of PC = 25 mTorr has a visible yellow tint; i) Although it is more than 50% thicker, the low?loss a?Si:H deposited at TP = 200 °C, and PC = 45 mTorr exhibits high transparency. Wafer diameter: 4 inches.
Credit
Junsuk Rho (POSTECH), Wiley
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