Structural and THz far-field characterizations of the LC integrated metalens (IMAGE)

SPIE--International Society for Optics and Photonics

Structural and THz far-field characterizations of the LC integrated metalens

Caption

Structural and THz far-field characterizations of the LC integrated metalens: (a) SEM micrograph of the partial dielectric metasurface. (b) Micrograph of the partial photo-patterned LCs under crossed polarizers. Scale bars in (a) and (b) indicate 100 and 500 μm, respectively. (c) Simulated and measured focal lengths of the metalens from 0.9 to 1.4 THz with/without a saturated bias (75 Vrms). (d) Imaging of a "smiling face" mask using this metalens at bias OFF state. The image is clearly revealed within the designed broadband due to the achromatic focusing. (e) Imaging of the same mask with a saturated bias on LCs. The distortion at lower frequencies is due to the deviation of focal length from the achromatic one.

Credit

Image courtesy of Zhixiong Shen et al., Nanjing University.

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