The scaling of CMOS technology according to Moore’s law and three characteristics of atomic level deposition during nanomanufacturing (IMAGE)

International Journal of Extreme Manufacturing

The scaling of CMOS technology according to Moore’s law and three characteristics of atomic level deposition during nanomanufacturing

Caption

The downscaling of nanomaterials, nanostructures, nanodevices and nanosystems needs atomic level deposition, and there are three characteristics of atomic level deposition including bringing lateral angstrom resolution to the vertical direction, template-assisted alignments with high accuracy, non-template selective deposition.

Credit

by Rong Chen, Yi-Cheng Li, Jia-Ming Cai, Kun Cao, Han-Bo-Ram Lee

Usage Restrictions

Credit must be given to the creator.

License

CC BY

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