Semiconductor Wafer Produced with Chemical Vapor Deposition (image) National Institute of Standards and Technology (NIST) Share Print E-Mail Caption Process Engineer Richard Kasica of NIST's Center for Nanoscale Science and Technology holds a wafer of the type typically produced in the plasma-enhanced chemical vapor deposition chamber at center. Credit C. Suplee/NIST Usage Restrictions Please credit C. Suplee/NIST when using the image. Share Print E-Mail Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.