Nanotower (image)

Toyohashi University of Technology

Caption

細胞膜を突き破る高さ100 µm以上の‘ナノタワー’電極。シリコン結晶成長技術と三次元的なマイクロ／ナノプロセス技術により、非常にアスペクト比の高い細胞内電極を実現した。

Credit

COPYRIGHT (C) TOYOHASHI UNIVERSITY OF TECHNOLOGY. ALL RIGHTS RESERVED.

Usage Restrictions

None

Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.