Schematic of Resist (IMAGE) DOE/Lawrence Berkeley National Laboratory Caption When low concentrations of crosslinker are added to the resist (left), it is able to pattern smaller features and doesn't require longer, expensive exposures as with a high concentrations of crosslinker (right). Credit Prashant Kulshreshtha, Berkeley Lab Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.