Illustration (IMAGE)
Caption
An illustration of 3DIC advanced packaging, showing key metal interconnect structures, including Cu-Cu bonding, RDL and TSV/TGV. The team aims to develop electroplating copper solutions to control material microstructures to address the metallisation challenges in 3DIC packaging.
Credit
City University of Hong Kong
Usage Restrictions
Image must be used with appropriate caption and credit.
License
Original content