Figure 1 | Principle of digital phase-shift mask projection lithography (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 1 | Principle of digital phase-shift mask projection lithography

Caption

Figure 1 | Principle of digital phase-shift mask projection lithography. a, Schematic of digital projection lithography system and illustration of phase-shift-induced interference enhancement, showing how a π phase difference between adjacent pixels generates destructive interference to improve image contrast and suppress sidelobes. b, Schematic of the dual-SLM projection lithography system, where one SLM controls amplitude modulation and the other controls phase modulation, enabling programmable complex optical field synthesis.

Credit

Yuan-Yuan Zhao et al.

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