Figure 2 | Digital phase-shift mask projection lithography for sub-diffraction patterning (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure 2 | Digital phase-shift mask projection lithography for sub-diffraction patterning

Caption

Figure 2 | Digital phase-shift mask projection lithography for sub-diffraction patterning.  a, Comparison of SEM and intensity distributions with/without π-phase shifts, demonstrating enhanced contrast as the phase difference approaches π, leading to improved resolution and sharper feature edges. b, Representative experimental nanostructures and IC metal-layer patterns fabricated using the proposed PSM-DPL method, showing dense line arrays and sub-300 nm pitch features.

Credit

Yuan-Yuan Zhao et al.

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