Reactive Ion Etching (IMAGE) Georgia Institute of Technology Caption Georgia Tech graduate research assistant Mason Chilmonczyk examines a device after a plasma etch step in a reactive ion etching (RIE) tool. The work was being done in the Institute of Electronics and Nanotechnology's Marcus Building clean room. Credit Rob Felt, Georgia Tech Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.