Semiconductor Wafer Produced with Chemical Vapor Deposition (IMAGE)

National Institute of Standards and Technology (NIST)

Semiconductor Wafer Produced with Chemical Vapor Deposition

Caption

Process Engineer Richard Kasica of NIST's Center for Nanoscale Science and Technology holds a wafer of the type typically produced in the plasma-enhanced chemical vapor deposition chamber at center.

Credit

C. Suplee/NIST

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