Remote ICP-CVD system (IMAGE)

Ulsan National Institute of Science and Technology(UNIST)

Remote ICP-CVD system

Caption

Remote ICP-CVD system with borazine mass flow controller (MFC) for precise control of borazine flow. The a-BN films were grown on Si substrates at 400 °C.

Credit

UNIST, SAIT, University of Cambridge, Catalan Institute of Nanoscience and Nanotechnology

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