News Release

Hybrid nano-PER: Scalable metasurfaces to accelerate mass production for high-performance optics

New TiO2 nano-PER hybrid structure overcomes fabrication bottlenecks by reducing meta-atom height by over 27% while maintaining high efficiency

Peer-Reviewed Publication

Chinese Society for Optical Engineering

Schematic of Hybrid nano-PER metasurface

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Overall processes to implement the hybrid TiO2 nanoparticle-embedded resin (nano-PER) metasurfaces.

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Credit: https://doi.org/10.1186/s43074-025-00204-4 (figure 1a) Junsuk Rho’s Lab/POSTECH/Photonix

Metasurfaces, with their ability to manipulate light at the nanoscale, offer immense potential to replace bulky conventional optics with compact, lightweight devices. However, the path to commercialization has been blocked by fabrication challenges: scalable methods like NIL often use low-index resins, which require tall, high-aspect-ratio meta-atoms that are difficult and costly to produce without defects.The proposed solution is a hybrid meta-atom based on TiO2 nanoparticle-embedded resin (nano-PER). This composite material enhances the refractive index (~ 2.0 in the visible spectrum) of standard imprint resins (~ 1.5) while retaining printability. The core innovation is the deposition of a thin TiO2 film (refractive index ~2.5) using Atomic Layer Deposition (ALD) onto the nano-PER structure. This "hybrid" approach achieves a sufficiently high effective refractive index contrast between two axes of dominant modes. Through this design, the team achieved a significant reduction in structural dimensions: the meta-atom height was minimized to 650 nm (down from 900 nm in previous polymer-only hybrids). This reduction ensures greater stability and robustness in the fabrication process. Using Particle Swarm Optimization (PSO), the meta-atom parameters were fine-tuned for broadband performance across RGB wavelengths (450, 532, and 635 nm). The optimized structure (coated with an 18 nm TiO2 film) achieved an impressive average conversion efficiency of 76%. A hyperbolic metalens was successfully fabricated using the combined NIL and ALD process, which is compatible with semiconductor fabrication and supports high-throughput, low-cost mass production. Experimental results confirmed its effectiveness, achieving an average focusing efficiency of 51.23% across the RGB wavelengths and demonstrating diffraction-limited performance with an average Strehl ratio of 0.86. These findings mark a crucial step in simplifying nanofabrication and advancing the commercial viability of high-performance metasurfaces.


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