Professor Shintake studies his design for in-line, high-NA EUV lithography (IMAGE)

Okinawa Institute of Science and Technology (OIST) Graduate University

Professor Shintake studies his design for in-line, high-NA EUV lithography

Caption

Professor Shintake uses OpTaliX, an optical simulation system, to figure out the precise placement and angles of mirrors for his EUV lithography optical system design.

Credit

Andrew Scott, OIST

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