Fig. 5. Photograph of the spatial light intensity acquisition system, the self-developed proximity lithography platform, and the developed patterns on the self-developed proximity lithography platform with the proposed illumination system. (IMAGE)
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Fig. 5. Photograph of the spatial light intensity acquisition system, the self-developed proximity lithography platform, and the developed patterns on the self-developed proximity lithography platform with the proposed illumination system.
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Copyright © 2026 Guangbiao Wang et al.
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