Figure1 | Overview of curvilinear mask technology. (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Figure1 | Overview of curvilinear mask technology.

Caption

Figure1 | Overview of curvilinear mask technology. This diagram details the integrated manufacturing ecosystem across the layout, mask, and wafer dimensions. It maps five core stages: curvilinear layout design, optical proximity correction, mask enablement, mask writer, and wafer metrology. These stages illustrate the continuous process and data flow required for technology deployment.

Credit

Tie Jun Cui et al.

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Credit must be given to the creator.

License

CC BY

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