Schematic of Nanoarchitecture (IMAGE)
Caption
Electron beam lithography is used to adjust the spacing and thickness of line patterns etched onto a template (lower layer). These patterns drive a self-assembling block copolymer (top layer) to locally form different types of patterns, depending on the underlying template. Thus, a single material can be coaxed into forming distinct nanopatterns for example, lines or dots ‹ in close proximity. These mixed-configuration materials could lead to new applications in microelectronics.
Credit
Brookhaven National Laboratory
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