"Turning spin loss into energy", developing a key technology for ultra-low power next-generation information devices
Peer-Reviewed Publication
Updates every hour. Last Updated: 20-Dec-2025 06:11 ET (20-Dec-2025 11:11 GMT/UTC)
Dr. Dong-Soo Han's research team at the Korea Institute of Science and Technology (KIST) Semiconductor Technology Research Center, in collaboration with the research teams of Prof. Jung-Il Hong at DGIST and Prof. Kyung-Hwan Kim at Yonsei University, has developed a device principle that can utilize "spin loss," which was previously thought of as a simple loss, as a new power source for magnetic control.
Inverse lithography technology (ILT) is driving transformative innovations in semiconductor patterning processes. This paper reviews the evolution of ILT, providing an analysis of the applications in semiconductor manufacturing. In recent years, artificial intelligence (AI) has introduced breakthroughs for ILT, such as convolutional neural networks, generative adversarial networks, and model-driven deep learning, demonstrating potential in large-scale integrated circuit design and fabrication. This paper discusses future directions for ILT, which is expected to provide insights into semiconductor industry development.
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