Recently, a joint research team from Hangzhou Institute of Technology of Xidian University, Humboldt University and the Max Born Institute announced a breakthrough in fabricating high-precision tunable nanogratings through femtosecond laser bursts-induced oxidation of amorphous silicon films. This achievement overcomes the limitations of conventional processes and provides a pioneering solution for high-efficiency, high-quality, and controllable self-organized micro/nanofabrication driven by femtosecond lasers. The related findings, entitled‘Burst Laser-Driven Plasmonic Photochemical Nanolithography of Silicon with Active Structural Modulation’, were recently published in Ultrafast Science, a subsidiary journal of Science.
